Photo etching
We accept small-scale prototypes using precision photolithography technology for fine processing.
We accept small-scale prototypes using photolithography and precision phototechnology, which are essential technologies in MEMS and display devices. We form thin films on substrates such as glass substrates, silicon wafers, films, and ceramics, and create fine patterns through a consistent photolithography process. We can accommodate prototypes starting from a single piece. We also support prototypes for dicing, bump formation, and more. Additionally, patterning of dielectric films and multilayer films is possible through lift-off processing. Substrate sizes can be customized. Etching of silicon wafers and glass substrates is also available. We can respond with short lead times (consultation required), and we support both rigid and flexible printed circuit (FPC) substrates. For more details, please contact us or refer to our catalog.
- Company：豊和産業
- Price：Other
